Ultrapure Water (UPW)

UPW is essential in semiconductor, solar, and display manufacturing, where even trace ions, particles, and TOC can affect production yield. Stringent purity requirements mean conventional treatment systems are often insufficient to meet fab-level specifications.

Our Solutions

NanoH2O technologies support UPW production and wastewater recycling by delivering stable particle removal, deep ion rejection, and reliable polishing performance. They further improve UPW reliability by minimizing particle and ionic impurities, stabilizing feedwater for polishing units, and supporting high‑recovery recycling. This helps advanced fabs reduce defect rates and increase manufacturing yield.

NanoH2O Technologies

  • UF: Nano level particle removal
  • RO: Deep ion and organics removal
  • IX: Final polishing to 18.2 MΩ·cm

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