Microelectronics (Semiconductor, Display, Solar)

UF: Nano-level particle removal and RO pretreatment
RO: Deep ion and organics removal for UPW feedwater
IX: Final polishing to 18.2 MΩ·cm

Semiconductor fabs, display manufacturing, and solar cell production require the industry’s highest water quality standards, as even trace contaminants can affect product performance and yield.

Our Solutions

NanoH2O technologies ensure stable UPW production by minimizing particles, ions, and TOC levels, supporting applications such as ultrapure water generation, fab wastewater recycling, and advanced manufacturing polishing stages. This improves yield, reduces defect rates, and enables high recovery reuse programs critical for water-intensive microelectronics operations.